Appendix 6: Matamata Airport Protection - Definition and Terms (See Also Part C - Planning Maps)
1. Main Runway Strip:
The Main Runway Strip is 1137 m long by 137 m wide. The coordinates and elevations of the four corners of the Main Runway Strip, in terms of the Geodetic Datum 1949 - Mt. Eden Circuit and the Moturiki Datum are as follows:
mN |
mE |
Elevation |
604532.98 |
385749.90 |
47.20 |
604417.58 |
385676.06 |
47.20 |
603804.84 |
386633.76 |
49.20 |
603920.24 |
386707.60 |
49.20 |
2. Subsidiary Runway Strip:
The Subsidiary Runway Strip is 896 m long and 91 m wide. The coordinates and elevations of the corners of the Subsidiary Runway Strip, in terms of Geodetic Datum 1949 - Mt. Eden Circuit and the Moturiki Datum are as follows:
mN |
mE |
Elevation |
604548.63 |
385672.95 |
47.20 |
604628.51 |
385629.37 |
47.20 |
605057.63 |
386415.93 |
46.70 |
604977.74 |
386459.51 |
46.70 |
3. Horizontal Surface:
The Horizontal Surface is located in a horizontal plane above the Runway Strips with an elevation of 92 m Moturiki Datum having its outer limit at a locus of 4000 m measured from the periphery of the Strips defined above.
4. Conical Surface:
The Conical Surface slopes upwards and outwards from the periphery of the Horizontal Surface at a gradient of 1 vertical to 20 horizontal (1 in 20) to an elevation of 197 m above Moturiki Datum.
5. Approach Surfaces:
There is an Approach Surface at both ends of the Runway Strips. Each Approach Surface rises upwards and outwards from the ends of the Strips at a gradient of 1 vertical to 30 horizontal (1 in 30) rising to intersect the horizontal surface. Each side of the Approach Surface diverges from the extended line of each edge of the Strip at a rate of 10% of the distance from the end of the Strip.
6. Transitional Side Surfaces:
The Transitional Side Surfaces rise upwards and outwards from the sides of both the Main and the Subsidiary Runway Strips and the edges of each Approach Surface at a gradient of 1 vertical to 5 horizontal (1 in 5) to intercept the Horizontal Surface.